The precise determination of trace impurities is critical to establishing the monetary value and usability of high-purity ruthenium. By quantifying all impurities and subtracting their total from 1000‰, the metal’s purity can be accurately calculated. This application report showcases the capabilities of Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES) for ruthenium analysis, highlighting its exceptional sensitivity, multi-element detection capabilities, and extensive linear dynamic range.
Compliant with ASTM B717 − 96 standards, the report details the methodology for detecting trace elements in ruthenium, including typical detection limits and accuracy studies. Explore how ICP-OES with Dual Side-on plasma observation ensures precise and reliable elemental analysis, empowering industries to meet stringent quality demands and protect the value of this precious metal.
Learn more in this informative application report