The exceptional value of rhodium relies heavily on its purity, making the accurate determination of trace impurities essential for valuation and industrial applications. Purity is calculated by analyzing all detectable impurities and subtracting their total from 1000‰. This report explores the use of Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES) as a highly effective method for trace element analysis, offering multi-element detection, superior sensitivity, and a broad linear dynamic range.
Aligned with ASTM B671 − 81 standards, this application report provides a detailed methodology for detecting trace elements in high-purity rhodium. It features insights into detection limits, accuracy studies, and the advantages of ICP-OES with dual side-on plasma observation. Discover how this cutting-edge elemental analysis approach ensures precise impurity analysis, safeguarding rhodium’s value and usability in demanding applications.
Learn more in this informative application report