Analysis of Trace Elements in High Purity Iridium by ICP-OES With Dual Side-On Plasma Observation

Application Brief

Elemental Analysis of Trace Elements in High Purity Iridium by ICP-OES With Dual Side-On Plasma Observation

The value of iridium and its metal products hinges on their exceptional purity, making the accurate determination of trace impurities essential for trade and industrial applications. By subtracting the quantified impurities from 1000‰, the purity of high-value iridium is precisely calculated. This report highlights the advanced capabilities of Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES) as the preferred method for analyzing trace elements in precious metals, offering unmatched sensitivity, multi-element detection, and an extensive linear dynamic range.

With a focus on compliance with ASTM B671 − 81 standards, this application report provides an in-depth overview of ICP-OES methodology for iridium analysis. Discover typical detection limits, accuracy studies, and insights into how this elemental analysis technology ensures the reliable characterization of high-purity iridium. Whether for financial valuation or industrial application, this report equips you with the tools to achieve superior analytical precision.

Learn more in this informative application report